Bibliographie

Bibliographie

Aldrich
Feinchemikalien-Katalog.
Steinheim (1990)

H.Anders
Dünne Schichten für die Optik.
Stuttgart (1965)

W.J.Anderson
Optical characterization of thin films,
J.Opt.Soc.Am. Vol.67 No.8, S. 1051-1058 (1977)

K.Balasubramanyan, L.J.Chen, A.L.Ruolff, et al.
Transmission Electron Microscope Study on Ion and Electron Beam induced structural Changes in a-Ge0.25Se0.75 Inorganic Resist Thin Films ,
J.Appl.Phys. Vol.53 No.8, S. 5975-5978 (1982)

V.Bögli, P.Unger, H.Beneking, B.Greinke, P.Guttmann, B.Niemann, D.Rudolph, G.Schmahl
Microzone Plate Fabrication by 100 keV Electron Beam Lithography,
aus Sayre, S. 80-87 (1988)

G.S.Cargill
Anisotropic Microstructure in Evaporated Amorphous Germanium Films,
Phys.Rev.Lett. Vol.28, S. 1372-1375 (1972)

G.C.Chen, I.Lauks
Spin-Coated amorphous Chalcogenide Films,
J.Appl.Phys. Vol.53 No.10, S. 6979-6982 (1982)

A.S.Chen, G.Addiego, W.Leung, A.R.Neureuther
Electron Beam Investigation and use of Ge-Se Inorganic Resist,
J.Vac.Sci.Technol. Vol.B4 No.1, S. 398-402 (1986)

K.L.Chopra, L.K.Malhotra, F.S.Hashvardhan, B.Singh
Radiation-Induced Microlithographic Effects in Amorphous Chalcogenide Films,
aus Doane, S. 129-146 (1982)

Ch.David
Galvanische Herstellung von Phasenzonenplatten aus Nickel für die Röntgenmikroskopie.
Diplomarbeit an der Forschungseinrichtung Röntgenphysik, Göttingen (1989)

A.G.Dirks, H.J.Leamy
Columnar Microstructure in vapor-deposited thin Films,
Thin Solid Films Vol.47, S. 219-233 (1977)

Hrsg.: D.A.Doane, A.Heller
Proceedings of the Symposion on Inorganic Resist Systems.
Proc.Electrochemical Society Vol.82 No.9, (1982)

G.Gräfe
Anorganische Gifte und Arzneimittel
Seite 987

Hrsg. G-I-T Verlag
GIT-Arbeits- und Merkblätter.
Arbeitsblatt 025 GIT 7 Heft 1, Darmstadt (1963)

P.Guttmann, G.Schneider, M.Robert-Nicot, B.Niemann, D.Rudolph, J.Thieme, T.M.Jovin, G.Schmahl
X-Ray-Microscopy Investigations on Polytene Chromosomes isolated from Silvary Glands of Chironumus Tumi Lavae,
aus Hrsg.: P.Michette X-Ray Microscopy III.
Springer Series in Optical Science, erscheint im Herbst 1991

B.L.Henke, P.Lee, T.J.Tanaka, et al.
Low Energy X-Ray Interaction Coefficients: Photoabsorption, Scattering and Reflection,
Atomic Data and Nuclear Data Tables 27, S. 1-144 (1982)

R.Hilkenbach, J.Thieme, P.Guttmann, B.Niemann
Phase Zone Plates for the Göttingen X-Ray Microscopes,
aus Sayre, S. 95-101 (1988)

P.G.Hugett, K.Frick, H.W.Lehmann
Development of Silversensitized Germanium Selenide Photoresist by Reactive Sputter Etching in SF6,
Appl.Phys.Lett. Vol.42 No.7, S. 592-594 (1983)

P.G.Huggett, H.W.Lehmann
The germanium selenide/Polymer Bilevel Photoresist System - A Review,
J.Electronic Materials Vol.14, No.3 S. 205-230 (1985)

Jürgen Husemann
Untersuchung zur Bestimmung von Ätzraten beim reaktiven Ätzen von Materialien zur Herstellung von Phasenzonenplatten,
Diplomarbeit an der Forschungseinrichtung Röntgenphysik, Göttingen (1990)

Jan Ingwersen
Darstellung und Untersuchung der photoempfindlichen Chalkogenidgläser
---Germaniumselenid---Germaniumsulfid--- für die Mikrolithographie.
Diplomarbeit an der Forschungsgruppe Röntgenmikroskopie, Göttingen (1987)

I.Janossy, A.Jakli, J.Haito
Photodarkening an Light Induced Anisotropy in Chalcogenide Glasses,
Sol.State.Com. Vol.51, No.10 S. 761-764 (1984)

R.Kaltofen, R.Opitz, K.Schumann, J.Ziemann
Tabellenbuch Chemie.
Leipzig 1975

Y.Kawamoto, S.Tsuchihashi
Glass-Forming Regions and Structure of Glasses in the System Ge-S,
Journal of the American Ceramic Society Vol.52, No.11 S. 626-627 (1969)

Y.Kawamoto, S.Tsuchihashi
Properties and Structure of Glasses in the System Ge--S,
Journal of the American Ceramic Society Vol.54 No.3, S. 131-135 (1971)

G.Kluge
Zur Photodotierung amorpher Ge- und As- Chalkogenide,
J.Inf.Rec.Mater. Vl.16/3, S. 177-184 (1988)

M.T.Kostyshin, E.V.Mikhailovskaja, P.F.Romanenko
Photographic Sensitivity Effect in Thin Semiconducting Films on Metall Substrates,
Soviet Physics-Solid State Vol.8 No.2, S. 451-2 (1966)

D.F.Kyser
Monte Carlo Calculations for Electron Microscopy, Microanalysis and Microlithography,
Scanning Electron Microscopy Vol.46, S. 47-62 (1981)

V.E.Lamberti, S.M.Vincent, C.T.Kemmerer, R.G.Vadimsky
Growth of c-Ag2Se on g-Ge0.1Se0.9 Inorganic Photoresist:
Photon and Ion Beam Induced Densification of Germanium,
The Effect of Its Thickness on Lithograhic Performance,
aus Doane, S. 191-202 (1982)

P.H.Lamey jr.
Submicron Lithography.
Manufactoring Implications of multilevel Resist Processing.
SPIE Vol.333, S. 59-66 (1982)

Landolt-Börnstein
nach Gleichungen zu den Dampfdruckkurven aus Band 2 Teil 2

W.Langheinrich
Sub-Mikrometer-Lithographie,
Diplomarbeit an der Fachabteilung für Elektrotechnik der RWTH, Aachen (1990)

S.A.Lis, J.M.Lavine
Ag Photodoping of amorphous chalcogenides,
Appl.Phys.Lett. Vol.42 No.8, S. 675-677 (1983)

L.I.Maissel, R.Glang
Handbook of Thin Film Technology.
New-York (1970)

Charles E.Mortimer
Chemie,
Stuttgart 5(1987)

M.Nakase, Y.Utsugi, A.Yoshikawa
Exposure Characteristics an Proximity Effect in Ag2Se/GeSe4 Inorganic Photoresists,
J.Vac.Sci.Technol. Vol.A3 No.4, S. 1849-1854 (1985)

B.Niemann
The Göttingen Scanning X-Ray Microscope,
aus Schmahl, S. 217-226 (1984)

E.Ong, K.L.Tai, R.G.Vadimsky, C.T.Kemmerer
Application of GeSe as a Deep-UV Resist for Submicron Lithography,
aus Doane, S. 71-90 (1982)

J.C.Phillips
Structural Principles of Amorphous an Glassy Semiconductors,
J.Non.Cryst.Sol. Vol.36, S. 1157-1165

J.C.Phillips
Phase Seperation an Submicrostructure in Semiconductive Glasses,
aus Doane, S. 147-156 (1982)

J.C.Phillips
Physics of Ag Photodoping in Chalcogenide Alloy Glasses,
J.Non.Cryst.Sol. Vol.64, S. 81-85 (1984)

Kenneth John Polasko
Application of disilverselenide/germaniumdiselenide for optical and electron-beam microlithography,
Univ.Microfilms International Ordernumber DA 8522214,
Dissertation Stanford University 1985

K.J.Polasko, C.C.Tsai, M.R.Cagan, R.F.W.Pease
Silver Diffusion in Ag2Se/GeSe2 Inorganic Resist System,
J.Vac.Sci.Technol. Vol.B4 No.1, S. 418-421 (1986)

T.Rayment, S.R.Elliott
Small Angle Neutron Scattering Study of Anisotropic Growth, Morphology and Irreversible Photodensification on GeSe3 Films,
Phys.Rev.B Vol.28, S. 1174-1177 (1983)

L.Reimer, G.Pfefferkorn
Raster-Elektronenmikroskopie,
Berlin (1977)

D.Rudolph, B.Niemann, G.Schmahl, O.Christ
The Göttingen X-Ray Microscope and X-Ray Experiments at the BESSY Storage Ring,
aus Schmahl, S. 192-203 (1984)

Hrsg.: D.Sayre, M.Howells, J.Kirz, H.Rarback
X-Ray Microscopy II.
Proceedings of the International Symposium, Brookhaven,
August 31- September 4, 1987
Springer Series in Optical Science Vol.56, Berlin (1988)

G.Schmahl, D.Rudolph
X-Ray Microscopy.
Proceedings of the International Symposium, Göttingen,
September, 14-16, 1983
Springer Series in Optical Science Vol.43, Berlin (1984)

G.Schmahl, D.Rudolph, P.Guttmann, O.Christ
Zone Plates for X-Ray Microscopy,
aus Schmahl, S. 63-74 (1984)

W.G.Schrenk
Analytical Atomic Spectroscopy.
New York/London (1975)

B.Singh, S.Rajagopalan, P.K.Bhat, D.K.Pandya, K.L.Chopra
Photocontraction Effect in Amorphous Se(1-x)Gex Films,
Sol.State.Com. Vol.29, S. 167-169 (1978)

B.Singh, S.P.Beaumont, P.G.Bower, C.D.W.Wilkinson
Sub-50-nm Lithography in Amorphous Se-Ge Inorganic Resist by Electron Beam Exposure,
Appl.Phys.Lett. Vol.41 No.10, S. 1002-1004 (1982)

K.Tada, N.Tanino, T.Murai, Y.C.Liang, K.Furutani
Photodarkening Effect in Sputterd Films of Sulfur- and/or Selenium-Based Chalcogenide Glasses,
Thin Solid Films Vol.108, S. 293-299 (1983)

K.L.Tai, E.Ong, R.G.Vadimsky, C.T.Kemmerer, P.N.Bridenbaugh
Model of Image Formation in Ag2Se/GexSe(1-x) Resist Systems: Implications for Microlithography,
aus Doane, S. 49-70 (1982)

K.L.Tai, R.T.Vadimsky, E.Ong
Submicron Lithography.
Multilevel Ge-Se Film Based Resist Systems,
SPIE 333, S. 32-39 (1982)

K.Tanaka, Y.Kasanuki, K.Odojima
Physical Properties and Photoinduced Changes of amorphous Ge-S Films,
Thin solid films Vol.117, S. 251-260 (1984)

D.M.Tennant, L.D.Jackel, R.E.Howard, E.L.Hu, et al.
Twentyfive nm features patterned with trilevel e-beam resist,
J.Vac.Sci.Technol. Vol.19, S. 1304-1307 (1981)

J.Thieme
Theoretical Investigations of Imaging Properties of Zone Plates Using Diffraction Theory,
aus Sayre, S. 70-79 (1988)

A.Thomas, G.Kluge, P.Süptitz
Untersuchungen von aufgedampften (Ge - Se)-Schichten als Resist für die Mikrolithographie,
J.Inf.Rec.Mater. Vol.16 No.4, S. 265-273 (1988)

C.H.Tzinis, C.H.Chen, C.T.Kemmerer
The Reaction Products of SilverIons and Germanium-Selenide Films,
aus Doane, S. 157-168 (1982)

R.G.Vadimsky, K.L.Tai, E.Ong
Ag2Se/Ge-Se Resist Systems,
aus Doane, S. 37-48 (1982)

T.Venkatesan, B.Wilkens, K.Fisher
Photon and Ion Beam induced Densification of Germanium Selenide Films,
aus Doane, S. 215-222 (1982)

T.Venkatesan, B.Wilkens, S.Vincent
Silver Sensitation of Germanium Selenide Films,
J.Appl.Phys. Vol.53 No.9, S. 6453-6456 (1982)

A.Wagner, D.Barr
Silver Diffusion in Germanium Selenide Resist Systems,
aus Doane, S. 281-294 (1982)

Hrsg.: R.C.Weast
Handbook of Chemistry and Physics.
Boca Raton (1988)

B.Welz
Atomabsorptionsspektrometrie.
Weinheim (1976)

W.Wirth, Ch.Gloxhuber
Toxikologie,
S. 87-88, Stuttgart 1981

A.Yoshikawa, S.Hirota, O.Ochi, A.Takeda, Y.Mizushima
Ångströms Resolution in Se-Ge Inorganic Photoresist,
Jap.J.Appl.Phys. Vol.20 No.2, S. L81-L83 (1981)
Abkürzungen der Zeitschriftennamen
Appl.Phys.Lett. Applied Physical Letters
Jap.J.Appl.Phys.Japanese Journal of Applied Physics
J.Appl.Phys.Journal of Applied Physics
J.Electronic MaterialsJournal of Electronic Materials
J.Inf.Rec.Mater. Journal of Information Recording Materials
J.Non.Cryst.Sol.Journal of Non Crystalline Solids
J.Opt.Soc.Am.Journal of the Optical Society of America
J.Vac.Sci.Technol.Journal of Vacuum Science and Technology
Phys.Rev.BPhysical Review Ausgabe B
Phys.Rev.Lett.Physical Review Letters
Proc.Proceedings
Sol.State.Com.Solid State Communications
SPIEJournal of the Society of Photo-Optical Instrumentation Engineers
Proc.Electrochemical SocietyProceedings of the Electrochemical Society


© Jan Ingwersen