Patents

Patents granted:

4)
S. Eigler*, A. Hirsch,
Preparation Method for Graphene suitable for Graphene Production
Friedrich-Alexander-Universität Erlangen-Nürnberg, 2012,
EP12159480.8.

Patents applied:
3)
S. Eigler*, A. Hirsch,
Preparation Method for Graphene Oxide suitable for Graphene Production
Friedrich-Alexander-Universität Erlangen-Nürnberg, 2015,
EP15202056.6.

2)
N. Fukazawa, S. Eigler, C. Pithart,
High Molecular Organic Semiconductor Material, High Molecular Organic Semiconductor Thin Film and Organic Semiconductor Device
DIC Corporation, 2011,
JP2011221048A.

1)
H. Etori, T. Ebine, K. Matsuda, R. B. Frings, S. Eigler,
Modified graphene, film and molding
Dainippon Ink & Chemicals, 2009,
JP200909994.